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SiC plate for PVD
SiC plate for PVD
Detailed Description
Feature requirements
Why is Kallex better than others
Application
SiC plate is widely used as a wafer holder for the PVD process of aluminum nitride film
growth in LED industries.
Feature requirements
1. Excellent thermal conductivity
2. Good temperature uniformity
3. Good thermal shock resistance
2. Good temperature uniformity
3. Good thermal shock resistance
Why is Kallex better than others
1. Available in various specifications, also providing customized services
2. High quality and fast delivery
3. Fully densified, no out-gassing issue
2. High quality and fast delivery
3. Fully densified, no out-gassing issue