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SiC plate for ICP etching process

SiC plate for ICP etching process

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Detailed Description
Application

SiC plate is used as a wafer holder for ICP etching process in LED industry.
 
 
Feature requirements

1. Excellent thermal conductivity
2. Resistant to plasma shock
3. Good temperature uniformity
 

Why is Kallex better than others

1. Available in various specifications, also providing customized services
2. Stable quality and fast delivery
3. Refurbish service