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SiC edge (focus) ring
SiC edge (focus) ring
Detailed Description
Feature requirements
Why is Kallex better than others
Application
SiC edge ring is used in silicon wafer etching process.
Feature requirements
1. Good resistance to plasma bombardment
2. Excellent gas corrosion resistant
3. Wonderful thermal shock and thermal strain resistance
4. Easy to clean surface, without particle issue
5. Long-term use will not bend and deform
2. Excellent gas corrosion resistant
3. Wonderful thermal shock and thermal strain resistance
4. Easy to clean surface, without particle issue
5. Long-term use will not bend and deform
Why is Kallex better than others
1. Customized services
2. Many types available
3. Stable quality and fast delivery
2. Many types available
3. Stable quality and fast delivery